Oxford Instruments PlasmaPro 100
Inductively Coupled Plasma Chemical Vapour Deposition (ICPVD) System
Equipment Information
Asset Sticker
177735
Manufacturer
Oxford Instruments
Model
PlasmaPro 100
Equipment Type
Inductively Coupled Plasma Chemical Vapour Deposition (ICPVD) System
Application
Used for etching and thin film deposition of semiconductors, dielectrics, and metals in applications such as MEMS fabrication, nanostructuring, and materials research.
Description
The Oxford Instruments PlasmaPro 100 is a versatile plasma processing system designed for reactive ion etching (RIE) and plasma-enhanced chemical vapor deposition (PECVD). It offers excellent process control, uniformity, and flexibility for research and development in micro- and nanofabrication.
Description
The Oxford Instruments PlasmaPro 100 is a versatile plasma processing system designed for reactive ion etching (RIE) and plasma-enhanced chemical vapor deposition (PECVD). It offers excellent process control, uniformity, and flexibility for research and development in micro- and nanofabrication.
Contact Information
Contact
Nhat Khuong Nguyen
Email
nhatkhuong.nguyen@griffith.edu.au
Alternative Contact
Pradip Singha
Alternative Email
p.singha@griffith.edu.au
Other Information
Campus
Nathan
Certification
Group
SCG - Griffith Sciences
Element
QMF - Queensland Microtechnology Facility
Facility
Access
Self - Service After Training
iLab Link
Other Links
Research or Teaching
Research
Research Categories
40 - ENGINEERING , 4018 - Nanotechnology , 401805 - Nanofabrication, growth and self assembly
Restrictions
Visibility
Public