·  The GEMStar XT-S/D™ is a highly configurable, true benchtop Atomic Layer Deposition (ALD) system engineered for high-aspect-ratio particles and substrates up to 200 mm in both single and batch modes.

·  Equipped with an adjustable reactor temperature zone up to 300°C (with 450°C processing available on request), it delivers uniform gas distribution up to 200°C.

·  The system features either a single or dual manifold zone alongside four to eight high-speed ALD valve ports, including an integrated Pulsed Vapor Push (PVP™) zone to efficiently handle very low-pressure precursor materials.

·  Operating via the field-proven GEMFlow™ Control Software preloaded on a Windows laptop, users can easily save custom processes to ensure substrate-to-substrate consistency.