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Peak Scientific i-FlowLab 6026
Nitrogen Gas Generator"i-Flow Lab 6XX2 Nitrogen Generator from Peak Scientific provides a total laboratory solution for on-site generation of nitrogen gas."
4018 - NanotechnologyNathan Glenn Walker -
Oxford Lasers A Series
Laser Micro-Machining SystemThe Oxford Lasers A Series is a versatile laser micromachining system capable of precise material ablation, cutting, and patterning at micro- and nanoscale. It features high repetition rates and flexible beam delivery for accurate, [...]
401805 - Nanofabrication, growth and self assemblyNathan Pradip Singha -
Thermo Fisher Scientific Apreo 2 S LoVac
Field Emission - Scanning Electron Microscope (FE-SEM)The Thermo Fisher Scientific Apreo 2 S LoVac is a high-resolution scanning electron microscope (SEM) designed for detailed imaging and analysis of surface morphology. It operates in low-vacuum mode, enabling imaging of non-conductive [...]
340605 - Molecular imaging (incl. electron microscopy and neutron diffraction)Nathan Pradip Singha -
Edwards IXM600
Vacuum PumpThe Edwards iXM 600 is a new range of dry pumps built for green manufacturing. Using very low energy the efficient roots mechanism has been developed to dramatically reduce input power to 1.3 kW, 60% lower than the previous generation [...]
Nathan Glenn Walker -
Edwards iXM200
Vacuum PumpThe Edwards iXM 200 is a new range of dry pumps built for green manufacturing. Using very low energy the efficient roots mechanism has been developed to dramatically reduce input power to 1.3 kW, 60% lower than the previous generation [...]
Nathan Glenn Walker -
SPTS Primaxx uEtch
Hydrofluoric Acid (HF) etching machineThe SPTS Primaxx uEtch is a high-precision dry etching system designed for uniform material removal in micro- and nanofabrication. It provides controlled plasma etching for a wide range of materials, including semiconductors, metals, [...]
400908 - MicroelectronicsNathan Nhat Khuong Nguyen -
SPT Microtechnologies EpiFlx
Silicon Carbide (SiC) Epitaxial FurnaceChemical Vapour Deposition
This is a large production batch reactor for 3C-Silicon Carbide epitaxy up to 300 mm wafers via Chemical Vapor Deposition (CVD)
9001 - General LaboratoryNathan Leonie Hold -
Edwards iXM200
Vacuum PumpThe Edwards iXM 200 is a new range of dry pumps built for green manufacturing. Using very low energy the efficient roots mechanism has been developed to dramatically reduce input power to 1.3 kW, 60% lower than the previous generation [...]
Nathan Glenn Walker