Type
Tag
2,317 Results for
  • Park Systems NX20

    Atomic Force Microscope

    Park Systems NX20 Atomic Force Microscope (AFM) provides high-resolution [...]

    401810 - Nanoscale characterisation
    Nathan
    Leonie Hold
  • BOGE C30D

    Screw Compressor

    The compact compressors of the C Series work reliably and safely when large amounts of compressed air are required.

    2410 - Instrumentation
    Nathan
    Glenn Walker
  • Edwards Vacuum IQDP80

    Vacuum Pump

    "The iQ Drypumping System is a microprocessor controlled, modular, dry pump package that provides unparalleled control and monitoring facilities."

    9001 - General Laboratory
    Nathan
    Glenn Walker
  • Leybold Turbovac MAG 1500

    Turbomolecular Pump

    Accuracy, precision and reliability those are the features of these magnetically-levitated turbomolecular pumps. High pumping speed and gas throughput for faster pump down time improve equipment cycle times.

    9001 - General Laboratory
    Nathan
    Glenn Walker
  • Leybold Turbovac 250

    Turbomolecular Pump

    "Leybold TURBOVAC 250i turbomolecular high-vacuum pumps have a pumping speed up to 250 liters per second (l/s), with an ISO-K 100 inlet flange, and an ISO KF-16 exhaust foreline flange."

    9001 - General Laboratory
    Nathan
    Nhat Khuong Nguyen
  • Accuthermo AW-610

    Rapid Thermal Process Equipment

    "The AW610 is a rapid thermal processing (RTP) system, which uses high intensity visible radiation to heat single wafers for short process periods of time at precisely controlled temperatures for annealing. The process periods are [...]

    401804 - Nanoelectronics
    Nathan
    Philip Tanner
  • Heidelberg Instruments MLA150

    Maskless Aligner

    The Heidelberg Instruments MLA150 is a high-resolution maskless lithography (photolithography) [...]

    401412 - Precision engineering
    Nathan
    Pradip Singha
  • Laurell Technologies WS-650-23

    Spin Coater

    The Laurell Technologies WS-650-23 is a programmable spin processor designed for precise control of spin speed and acceleration during wafer cleaning and drying. It supports a variety of cleaning and rinsing protocols for surface [...]

    401805 - Nanofabrication, growth and self assembly
    Nathan
    Pradip Singha