Chemical Vapour Deposition

This is a large production batch reactor for 3C-Silicon Carbide epitaxy up to 300 mm wafers via Chemical Vapor Deposition (CVD)

The Edwards iXM 200 is a new range of dry pumps built for green manufacturing. Using very low energy the efficient roots mechanism has been developed to dramatically reduce input power to 1.3 kW, 60% lower than the previous generation [...]

"B1505A power device analyzer delivers a single-box solution that characterizes high power devices from sub-pico amps up to 10 kV / 1500 A."

"The DP27 is a 5 megapixel digital camera for microscopy with high-fidelity color reproduction and progressive scanning free from color shift, providing live images with superb quality, seamlessly integrated into the OLYMPUS [...]