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1488 Equipment Available

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  • Olympus MX50

    Microscope

    The MX50 semiconductor inspection microscope was developed specifically to meet the demands of wafer inspection. It is a user-friendly microscope that allows operators to work in an ergonomically correct position and benefit from [...]

    4009 - Electronics, sensors and digital hardware
    Nathan
    Glenn Walker
  • Hitech LPCVD

    Low Pressure Chemical Vapor Deposition (LPCVD)

    Low Pressure Chemical Vapor Deposition. It is a technique that uses heat and low pressure to deposit thin films of various materials on a solid substrate. The low pressure reduces unwanted gas phase reactions and improves film [...]

    400907 - Industrial electronics
    Khuong Nguyen
  • STS Multiplex Etch

    Inductively Coupled Plasma (ICP) Reactive Ion Etcher (RIE)

    High plasma density, low operating pressure, high etch rate, excellent etch uniformity. Suitable for etching a large range of materials.

    4009 - Electronics, sensors and digital hardware
    Nathan
    Glenn Walker
  • Micromeritics TriStar II Plus

    Rapid Thermal Process Equipment

    The Micromeritics TriStar II Plus is a fully automated surface area and porosity analyzer for rapid high throughput analysis with high accuracy. The three-station unit increases the speed and efficiency of routine quality control [...]

    400908 - Microelectronics
    Nathan
    Glenn Walker