Low Pressure Chemical Vapor Deposition. It is a technique that uses heat and low pressure to deposit thin films of various materials on a solid substrate. The low pressure reduces unwanted gas phase reactions and improves film [...]

High plasma density, low operating pressure, high etch rate, excellent etch uniformity. Suitable for etching a large range of materials.

The Micromeritics TriStar II Plus is a fully automated surface area and porosity analyzer for rapid high throughput analysis with high accuracy. The three-station unit increases the speed and efficiency of routine quality control [...]

Gamma 1000C is a sputtering tool that is capable of depositing conducting and insulating layers of materials in sequence or simultaneously.