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Equipment Search
1482 Equipment Available
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Leybold Turbovac 90
Turbomolecular Pump"Leybold TURBOVAC 90i turbomolecular high-vacuum pumps have a pumping speed up to 90 liters per second (l/s), with an ISO-K 63 inlet flange, and an ISO KF-16 exhaust foreline flange."
9001 - General LaboratoryNathan Nhat Khuong Nguyen -
Leybold Turbovac 250
Turbomolecular Pump"Leybold TURBOVAC 250i turbomolecular high-vacuum pumps have a pumping speed up to 250 liters per second (l/s), with an ISO-K 100 inlet flange, and an ISO KF-16 exhaust foreline flange."
9001 - General LaboratoryNathan Nhat Khuong Nguyen -
Elveflow OB1 Mk3
Flow Controller"The OB1 Mk3 technology enables fast pressurization of tanks up to 1 liter and enables you to set up long term microfluidic experiments. "
4012 - Fluid mechanics and thermal engineeringNathan Nhat Khuong Nguyen -
Keithley 2602B
Sourcemeter"This is tightly integrated, 4-quadrant voltage/current source and measure instrument which offers best in class performance with 6 1/2digit resolution."
4009 - Electronics, sensors and digital hardwareNathan Philip Tanner -
Tektronix DPO7104
Oscilloscope"The DPO7104 is a real-time digital phosphor oscilloscope and are the industry’s best solution to the challenging signal integrity issues faced by designers verifying, characterizing, debugging, and testing sophisticated [...]
4009 - Electronics, sensors and digital hardwareNathan Philip Tanner -
Olympus DP27
Microscope Camera"The DP27 is a 5 megapixel digital camera for microscopy with high-fidelity color reproduction and progressive scanning free from color shift, providing live images with superb quality, seamlessly integrated into the OLYMPUS [...]
401810 - Nanoscale characterisationNathan Daniel Haasmann -
Agilent B1505A
Power Device Analyser"B1505A power device analyzer delivers a single-box solution that characterizes high power devices from sub-pico amps up to 10 kV / 1500 A."
401804 - NanoelectronicsNathan Philip Tanner -
SPTS Primaxx uEtch
Hydrofluoric Acid (HF) etching machineThe SPTS Primaxx uEtch is a high-precision dry etching system designed for uniform material removal in micro- and nanofabrication. It provides controlled plasma etching for a wide range of materials, including semiconductors, metals, [...]
400908 - MicroelectronicsNathan Nhat Khuong Nguyen